ABSCISSA MIRROR PDF

238000004544 sputter deposition Methods 0.000 description 1.229910052760 oxygen Inorganic materials 0.000 description 1.MYMOFIZGZYHOMD-UHFFFAOYSA-N oxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1.238000005755 formation reaction Methods 0.000 description 1.230000015572 biosynthetic process Effects 0.000 description 1.238000006722 reduction reaction Methods 0.000 description 3.238000010521 absorption reaction Methods 0.000 description 6.

229910001928 zirconium oxide Inorganic materials 0.000 description 14.229910000449 hafnium oxide Inorganic materials 0.000 description 18.238000006731 degradation reaction Methods 0.000 claims description 3.230000004059 degradation Effects 0.000 claims description 3.230000015556 catabolic process Effects 0.000 claims description 3.239000003989 dielectric material Substances 0.000 claims description 4.239000010409 thin film Substances 0.000 claims description 5.239000000758 substrate Substances 0.000 claims description 6.MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Chemical compound O=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims abstract description 20.CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(IV) oxide Inorganic materials O=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 claims abstract description 22.239000000463 material Substances 0.000 claims abstract description 26.235000010215 titanium dioxide Nutrition 0.000 claims abstract description 32.229910052905 tridymite Inorganic materials 0.000 claims abstract description 54.229910052682 stishovite Inorganic materials 0.000 claims abstract description 54.235000012239 silicon dioxide Nutrition 0.000 claims abstract description 54.239000000377 silicon dioxide Substances 0.000 claims abstract description 54.229910052904 quartz Inorganic materials 0.000 claims abstract description 54.229910052906 cristobalite Inorganic materials 0.000 claims abstract description 54.

229910052681 coesite Inorganic materials 0.000 claims abstract description 54.

GWEVSGVZZGPLCZ-UHFFFAOYSA-N titan oxide Chemical compound O=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 64.

VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicium dioxide Chemical compound O=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 108.

Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.) Filing date Publication date Priority claimed from US28004388A external-priority Application filed by Honeywell Inc filed Critical Honeywell Inc Publication of EP0372438A2 publication Critical patent/EP0372438A2/en Publication of EP0372438A3 publication Critical patent/EP0372438A3/en Status Withdrawn legal-status Critical Current Links Original Assignee Honeywell Inc Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.) Cole Current Assignee (The listed assignees may be inaccurate.

Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.) Withdrawn Application number EP89122262A Other languages German ( de)

ABSCISSA MIRROR PDF

Google Patents UV and plasma stable high-reflectance multilayer dielectric mirrorĭownload PDF Info Publication number EP0372438A2 EP0372438A2 EP89122262A EP89122262A EP0372438A2 EP 0372438 A2 EP0372438 A2 EP 0372438A2 EP 89122262 A EP89122262 A EP 89122262A EP 89122262 A EP89122262 A EP 89122262A EP 0372438 A2 EP0372438 A2 EP 0372438A2 Authority EP European Patent Office Prior art keywords sio2 mirror pairs tio2 layer pairs Prior art date Legal status (The legal status is an assumption and is not a legal conclusion. Google Patents EP0372438A2 - UV and plasma stable high-reflectance multilayer dielectric mirror EP0372438A2 - UV and plasma stable high-reflectance multilayer dielectric mirror

Abscissa mirror